trichlorosilane
英
美
网络 三氯矽甲烷; 三氯氢硅; 三氯硅烷; 三氯矽烷; 三氯甲硅烷
双语例句
- The existing problems of gas data of synthesis furnace exit of trichlorosilane were analysed.
分析了三氯氢硅合成炉出口反应气体组分数据存在的问题。 - The method of tail gas harness of trichlorosilane synthesis furnace were introduced and compared.
介绍了治理三氯氢硅合成炉尾气的方法，并进行了比较。 - Brief introduction of application of ICP-OES in content determination of boron and phosphorus of trichlorosilane
ICP-OES在测定三氯氢硅中硼磷含量的应用 - Gas Chromatographic Determination ( GC) of Trace Trichlorosilane in High Purity Silicon Tetrachloride for Optical Fibers
光纤原料四氯化硅中微量三氯氢硅的气相色谱分析 - The phenylated silica gel has been prepared by the reaction between the surface hydroxyl groups of silica gel and phenyl trichlorosilane.
本文利用苯基三氯硅烷和硅胶表面羟基反应制备了苯基化硅胶。 - Progress on preparation and purification of trichlorosilane
三氯硅烷的制备及精制工艺进展 - Split-phase method quantitative determination of trace trichlorosilane in high purity silicon tetrachloride using FT-IR spectroscopy
FT－IR法测量高纯四氯化硅中的微量三氯氢硅 - For controlling the intensive hydrate reaction and the great heat released in the process and reducing the harm that caused by CaO, the hydrophobic surface-modification of CaO particles by silane cou-pling agent-octadecyl trichlorosilane at room temperature was intro-duced.
为了控制氧化钙水化反应急剧，并大量放热而引起各种危害，本文中用十八烷基三氯硅烷偶联剂在室温对氧化钙粉体进行疏水化表面改性。 - Layout and Lifting Scheme of Main Equipment of Trichlorosilane
三氯氢硅装置主要设备布置及吊装方案 - Production methods and processing of trichlorosilane are introduced, layout and lifting scheme of main equipment are described, characteristics of the three schemes are compared.
介绍了三氯氢硅的生产方法及工艺流程，叙述了装置设计中主要设备布置及吊装方案的确定过程，并对3种方案的特点进行了比较。 - The thesis discusses the phenyl chlorine silane cleaner production technologies, and puts forward the synthesis of phenyl trichlorosilane technical route through the application Grignard reaction which can solve shortcomings of traditional methods, that is high energy consumption, more by-products, and environment pollution. 2.
文中论述了苯基氯硅烷的清洁生产工艺，提出了用格氏法合成苯基三氯硅烷的研发思路，从根本上解决传统方法能耗高、副产物多，环境污染的缺点。 - Triethoxysilane is prepared by alcoholysis of trichlorosilane in industry, the process of which is complex, associated with a large number of hydrogen chloride gases, apparatus corrosion, pollution of the environment and low-yield.
工业上，三乙氧基硅烷由三氯硅烷醇解法制得，该反应工艺复杂，收率低，反应过程中伴有大量的氯化氢气体产生，腐蚀设备，污染环境。