Intaglio engraving of rejectamenta acid etching chemicals. 凹版雕刻用酸性蚀刻化学品废弃物。
Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power. 因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
The combination of refractory and noble metals in a single layer makes etching a formidable task. 难熔金属和贵金属组合的这一层薄膜使刻蚀成为一个艰巨任务。
HF vapor-phase etching was studied under different temperatures and different conditions for fabrication of suspended nano structure. 针对纳米悬浮结构的制作,对不同温度和不同气相条件下的***(HF)气相刻蚀进行了研究。
UV lithography, silicon etching and soft lithography were adopted to fabricate micropillar arrayed cell culture substrates. 以紫外光光刻、硅蚀刻及软光刻技术制备了微柱阵列型细胞培养基底。
The grain boundary energy was measured with thermal etching method. 用热蚀刻方法测量了合金的晶界能。
Electrochemical etching and replating process 电化腐蚀和电镀工艺
The paper describes that the principLe and advantage of Digital inkjet printing for etching circuits of PCB. 文章概述了用于PCB蚀刻线路中数字喷墨打印技术的原理和优点。
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique. 首先,采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道;
A method to study the sacrificial layer etching in nanometer is proposed after lots of experiments. 通过大量的实验研究,建立了一套纳米量级牺牲层腐蚀行为的实验研究方法。
An etching made by this process. There is corrode spot and pitting on the surface of all valve. 细点腐蚀制板法的过程所有阀门表面上都有腐蚀斑痕和麻点。
The technology process and mechanism of etching are also discussed in detail with examples of hollowing board process. 结合镂空板工艺实例,详细介绍了工艺过程,并讨论了取得的效果与蚀刻机理。
Based on the latest three-axis dynamic laser scanning technology, the mold laser etching process is investigated; 基于最新的三轴动态振镜扫描技术,对模具激光蚀刻工艺进行了探讨;
Effect of width ratio on the etching behaviour of joint channel structure is studied. 对宽度比对组合沟道结构的牺牲层腐蚀特性的影响进行了研究。
Based on electrochemical etching principles, the paper fabricated the micrometer scale wire electrodes used in WEMM. 本文基于电化学腐蚀原理,制备微细电化学线切割加工中使用的微米尺度线电极。
Besides, the anti-dry etching property is improved. 同时,也改善了抗干刻蚀的性能。
You are also on this basis and frosting and etching. 还可在此基础上磨砂和蒙砂。
It attacks most metals and is used for etching steel and photoengraving. 能与大多数金属起作用,用于蚀刻钢材和光刻。
The method also includes forming a recessed region in the cell array region by etching the semiconductor substrate. 该方法还包括通过刻蚀该半导体衬底,在单元阵列中形成凹陷区。
Circulating device is needed in electrochemical etching course. 在电化学刻蚀过程中,需增加循环装置。
Etching of the accessible etch targets ( 60,62) follows this process. 在该工序后,对可接近的刻蚀靶(60,62)进行刻蚀。
Also, severe biofouling, physical abrasion, and chemical etching of the glass may erode the sensing surface. 严重的玻璃生物淤积、理磨损和化学腐蚀可能影响感觉表面。
The Study of Porous InP Formed by Electrochemical Etching; 对易获得重现性好的化学蚀刻法进行了探研。
The twins in NYAB and NGAB crystals were investigated by synchrotron radiation topography and chemical etching method. 采用同步辐射形貌术结合化学腐蚀法,系统研究了NYAB和NGAB晶体中的孪晶结构。
Stencil manufacturing techniques include chemical etching, laser cutting and electroforming. 钢网制作技术包括化学腐蚀,激光切割和电铸。
The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching. 通过深紫外光刻和感应耦合等离子刻蚀设备,制备了所设计的器件。
This technique takes advantage of the large difference in etching properties for different crystallographic planes in alkaline solution. 这项技术利用了硅的不同晶面在碱性腐蚀溶液中具有不同腐蚀速率的特性。
This is generally printed using an etching press. 这通常是使用一个蚀刻印刷出版社。